dry-clean lotion

Wash the wafers with mixed acid, lotion and UPW (ultra pure water) by ultrasonic cleaning in wet sinks to get a clean and dry surface of wafers.

用混合酸、清洗剂和纯水在清洗槽或超声波清洗机内清洗硅片，使其表面洁净并烘干。

The clothes into the dry distillation, solvent in the water and detergent with both hands (wear gloves) rub is kneaded, silica gel wash clothings reoccupy after washing clean dry lotion.

将衣物放入蒸馏过的干洗剂溶剂中浸泡，然后用双手（戴上硅胶手套）搓揉，衣物洗净后再用干净的干洗剂冲洗。